Application of 3D EMF simulation for development and optimization of alternating phase shifting masksSEMMLER, Armin; MADER, Leonhard; ELSNER, Annika et al.SPIE proceedings series. 2001, pp 356-367, isbn 0-8194-4032-9, 2VolConference Paper

Inspectability of PSM masks for the 32nm node using STARlight2+HUANG, Chain-Ting; CHENG, Yung-Feng; KUO, Shih-Ming et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70282P.1-70282P.8, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

An introduction to stellar coronagraphy : Optical techniques for direct imaging of exoplanetsFERRARI, André; SOUMMER, Rémi; AIME, Claude et al.Comptes rendus. Physique. 2007, Vol 8, Num 3-4, pp 277-287, issn 1631-0705, 11 p.Article

The simulation of application of high transmittance AttPSM for sub-100 nm pattern in 248 nm lithographyLIN, Cheng-Ming; LOONG, Wen-An.Microelectronic engineering. 2001, Vol 57-58, pp 41-48, issn 0167-9317Conference Paper

Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelengthLAI, F. D; WANG, L. A.Microelectronic engineering. 2001, Vol 57-58, pp 439-445, issn 0167-9317Conference Paper

Aerial-image based inspection of AAPSM for 193nm lithography generationROSENBUSCH, Anja; HEMAR, Shirley; FALAH, Reuven et al.SPIE proceedings series. 2003, pp 375-382, isbn 0-8194-4996-2, 8 p.Conference Paper

Phase assignment for bright field of dense contactTANG, Nail.SPIE proceedings series. 2002, pp 138-145, isbn 0-8194-4517-7, 8 p.Conference Paper

Doubly exposed patterning using mutually one-pitch step shifted alternating phase shift masksLEE, Sung-Woo; CHUNG, Dong-Hoon; SHIN, In-Gyun et al.SPIE proceedings series. 2001, pp 762-769, isbn 0-8194-4032-9, 2VolConference Paper

Simplified models for edge transitions in rigorous mask modelingADAM, Konstantinos; NEUREUTHER, Andrew R.SPIE proceedings series. 2001, pp 331-344, isbn 0-8194-4032-9, 2VolConference Paper

Evaluation of 3D alternating PSM structures using mask topography simulation and AIMS at λ=193nmTABERY, Cyrus E; SPENCE, Christopher A.SPIE proceedings series. 2001, pp 429-440, isbn 0-8194-4032-9, 2VolConference Paper

Qualitative analysis of haze defectsCHOI, Jaehyuck; KOH, Soowan; SUNGHUN JI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 63492S.1-63492S.9, issn 0277-786X, isbn 0-8194-6444-9, 2VolConference Paper

A films based approach to intensity imbalance correction for 65 nm node c:PSMCOTTLE, Rand; SIXT, Pierre; LASSITER, Matt et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 1, 59920J.1-59920J.9Conference Paper

A novel GDSII compression techniquePEREIRA, Mark; BARUAH, Barsha.Proceedings of SPIE, the International Society for Optical Engineering. 2005, issn 0277-786X, isbn 0-8194-6014-1, 2Vol, Part 2, 59923N.1-59923N.8Conference Paper

Integrating Cr and MoSi etch for optimal photomask critical dimension uniformity and phase uniformityWISTROM, Richard; KOMIZO, Toru; NEMOTO, Satoru et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7122, issn 0277-786X, isbn 978-0-8194-7355-4 0-8194-7355-3, 71220F.1-71220F.9, 2Conference Paper

Wavelength dependent spot defects on advanced embedded attenuated phase-shift masksMAGG, Christopher; BENZ, Jason; KINDT, Louis et al.SPIE proceedings series. 2004, pp 72-80, isbn 0-8194-5513-X, 2Vol, 9 p.Conference Paper

Super-resolution enhancement method with phase-shifting mask available for random patternsMISAKA, Akio; MATSUO, Takahiro; SASAGO, Masaru et al.Symposium on VLSI technology. 2002, pp 200-201, isbn 0-7803-7312-X, 2 p.Conference Paper

Benchmarking of available rigorous electromagnetic field (EMF) simulators for phase-shift mask applicationsKALUS, Christian K; LIST, Steffen; ERDMANN, Andreas et al.Microelectronic engineering. 2001, Vol 57-58, pp 79-86, issn 0167-9317Conference Paper

The correlation between the chemical compositions and optical properties of TiSi_xN_y as an embedded layer for AttPSM in 193 nmLOONG, Wen-An; LIN, Cheng-Ming; TSENG, Show-Ping et al.Microelectronic engineering. 2001, Vol 57-58, pp 481-487, issn 0167-9317Conference Paper

Characterizing photomask etch processes by Phase Component Analysis (PCA)WISDOM, Richard; KOMIZO, Toru; HIBBS, Michael et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 673007.1-673007.7, issn 0277-786X, isbn 978-0-8194-6887-1Conference Paper

Recent application results from the novel e-beam based mask repair system MeRiT<^TM> MGEHRLICH, Christian; EDINGER, Klaus; HOFMANN, Thorsten et al.Proceedings of SPIE, the International Society for Optical Engineering. 2006, pp 62810M.1-62810M.8, issn 0277-786X, isbn 0-8194-6356-6, 1VolConference Paper

Evaluation of overlay accuracy of phase shift image for 65nm node masksKOMAGATA, Tadashi; KIMURA, Norio; FUNAKI, Kaoru et al.SPIE proceedings series. 2004, pp 1315-1322, isbn 0-8194-5513-X, 2Vol, 8 p.Conference Paper

Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducersHESJEDAL, T; SEIDEL, W.Nanotechnology (Bristol. Print). 2003, Vol 14, Num 1, pp 91-94, issn 0957-4484, 4 p.Article

The development of an I-line attenuated phase shift process for dual inlay interconnect lithographySTURTEVANT, John L; HO, Benjamin C. P; GEISZLER, Vincent C et al.SPIE proceedings series. 2000, pp 505-512, isbn 0-8194-3617-8Conference Paper

On-mask CD and overlay test structures for alternating aperture phase shift lithographySMITH, Stewart; MCCALLUM, Martin; WALTON, Anthony J et al.IEEE transactions on semiconductor manufacturing. 2005, Vol 18, Num 2, pp 238-245, issn 0894-6507, 8 p.Conference Paper

Fast and efficient phase conflict detection and correction in standard-cell layoutsCHIANG, C; KAHNG, A. B; SINHA, S et al.IEEE/ACM International Conference on Computer-Aided Design. 2005, pp 149-156, isbn 0-7803-9254-X, 1Vol, 8 p.Conference Paper